Silicon containing polymer and chemically amplified resist compo

Details Silicon containing polymer and chemically amplified resist compo Silicon containing polymer and chemically amplified resist compo

1999-02-17

2000-04-18

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430905, 430910, 526279, 526313, G03C 172

Patent

active

060513624

ABSTRACT:
A polymer for use in a chemically amplified photoresist and represented by the following formula: ##STR1## where R' is one selected from the group including: ##STR2## in which R.sub.1 is one selected from the group including --H and --CH.sub.3, m and n are integers, and m/(m+n)=0.1-0.6, and ##STR3##

REFERENCES:
patent: 4780516 (1988-10-01), Foley, Jr.
patent: 5883152 (1999-03-01), Anan
patent: 5981141 (1999-11-01), Choi et al.
Akiko Kotachi et al., "Si-Containing Positive Resist for ArF Excimer Laser Lithography" Photopolym Sci. Technol., vol. 8, No. 4, 1995, pp. 615-622.

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