Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2007-10-02
2007-10-02
Lee, Sin (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S326000, C430S313000, C430S314000, C430S315000, C430S318000
Reexamination Certificate
active
11263430
ABSTRACT:
Antireflective compositions characterized by the presence of an Si-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions are especially useful in lithographic processes used to configure underlying material layers on a substrate, especially metal or semiconductor layers.
REFERENCES:
patent: 4891303 (1990-01-01), Garza et al.
patent: 5380621 (1995-01-01), Dichiara et al.
patent: 5554485 (1996-09-01), Dichiara et al.
patent: 5641849 (1997-06-01), Nishida et al.
patent: 6025117 (2000-02-01), Nakano et al.
patent: 6087064 (2000-07-01), Lin et al.
patent: 6114085 (2000-09-01), Padmanaban et al.
patent: 6270948 (2001-08-01), Sato et al.
patent: 6420088 (2002-07-01), Angelopoulos et al.
patent: 6468718 (2002-10-01), Kang et al.
patent: 6527966 (2003-03-01), Shimomura et al.
patent: 2001-55512 (2001-02-01), None
patent: 2002164347 (2002-02-01), None
patent: 2002-107938 (2002-04-01), None
Machine-assisted English translation of JP 2002-107938 (provided by JPO).
Y. Matzuura, et al., “Synthesis of Polysilane-Acrylic Copolymers by Photopolymerization and Their Application to Positive Resists for EB Lithography”,Journal of Photopolymer Science and Technology, No. 2, 14: 175-180; (2001).
Angelopoulos Marie
Huang Wu-Song
Mahorowila Arpan P.
Moreau Wayne
Pfeiffer Dirk
Cai Yuanmin
Lee Sin
Scully , Scott, Murphy & Presser, P.C.
LandOfFree
Silicon-containing compositions for spin-on arc/hardmask... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Silicon-containing compositions for spin-on arc/hardmask..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silicon-containing compositions for spin-on arc/hardmask... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3841222