Silicon carbide constant voltage gradient gas feedthrough

Details Silicon carbide constant voltage gradient gas feedthrough Silicon carbide constant voltage gradient gas feedthrough

1996-04-16

1998-03-10

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118715, 338 20, 338 21, C23C 1600

Patent

active

057256756

ABSTRACT:
A method and apparatus is provided to prevent energy transfer to a gas which is flown through a gas line disposed between a biased member and grounded member. In one aspect of the invention, a semi-conductive sleeve, such as a silicon carbide sleeve, is provided which is disposed about a gas line and is in contact with the gas inlet manifold and the gas outlet manifold and has a resistance less than that of the gas which is flown through the gas line.

REFERENCES:
patent: 573558 (1896-12-01), Voss
patent: 2150167 (1939-03-01), Hutchins et al.
patent: 2329085 (1943-09-01), Ridgway
patent: 4549161 (1985-10-01), McTavish et al.
patent: 5000113 (1991-03-01), Wang et al.
patent: 5557250 (1996-09-01), Debbaut et al.

Affiliated with

Also associated with

Rating

Silicon carbide constant voltage gradient gas feedthrough does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Silicon carbide constant voltage gradient gas feedthrough, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Silicon carbide constant voltage gradient gas feedthrough will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-135814