Shutter disk and blade for physical vapor deposition chamber

Details Shutter disk and blade for physical vapor deposition chamber Shutter disk and blade for physical vapor deposition chamber

2006-03-07

2006-03-07

McDonald, Rodney G. (Department: 1753)

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

C204S298110

Reexamination Certificate

active

07008517

ABSTRACT:
The present invention generally provides a method and apparatus for use in a physical vapor deposition chamber. In one embodiment, invention provides a shutter disk mechanism that eliminates the need for axially orientating a shutter disk to a robot blade that transfers the shutter disk to a substrate support.

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