Shields usable with an inductively coupled plasma reactor

Details Shields usable with an inductively coupled plasma reactor Shields usable with an inductively coupled plasma reactor

2005-05-05

2009-08-04

McDonald, Rodney G (Department: 1795)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

Reexamination Certificate

active

07569125

ABSTRACT:
A one-piece inner shield usable in a plasma sputter reactor and extending from the target to the pedestal with a smooth inner surface and supported by an annular flange in a middle portion of the shield. The shield may be used to support the RF coil used in exciting the plasma. An outer shield includes an outwardly extending flange on its end alignable with the inner shield flange, holes in correspondence to recesses in the inner shield for standoffs for the RF coil, and circumferentially arranged gas flow holes.

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Ashtiani et al., “A new hollow-cathode magnetron source for 0.10μm copper applications”, 0-7803-6327-2, 2000, pp. 37-39.

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