Shield for a physical vapor deposition chamber

Details Shield for a physical vapor deposition chamber Shield for a physical vapor deposition chamber

1996-06-05

1998-10-20

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429811, 20429819, C23C 1434

Patent

active

058241973

ABSTRACT:
A target shield having a concave, curved surface away from a target in a physical vapor deposition chamber spaced so that the number of magnetic field lines that intersect said shield are reduced, results in improved vertical directionality of the sputtered material. High aspect ratio openings in a substrate can be filled at low pressures, e.g., 3 millitorr and lower, using this shield.

REFERENCES:
patent: 4927513 (1990-05-01), Schultheiss et al.
patent: 4946576 (1990-08-01), Dietrich et al.
patent: 5112467 (1992-05-01), Zejda
patent: 5362372 (1994-11-01), Tepman
patent: 5382339 (1995-01-01), Aranovich
patent: 5403459 (1995-04-01), Guo

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