Etching a substrate: processes – Forming or treating article containing magnetically...
Reexamination Certificate
2009-02-20
2011-12-20
Tran, Binh X (Department: 1713)
Etching a substrate: processes
Forming or treating article containing magnetically...
C360S097010, C216S075000
Reexamination Certificate
active
08080167
ABSTRACT:
The present invention relates to a shaping method of a thin film layer and a manufacturing method of a perpendicular recording magnetic head using the same. In the thin film layer shaping method according to the present invention, since a second thin film of a lower etching rate is etched by a preliminary etching amount allowing for a difference between the etching rate of the second thin film and an etching rate of a first thin film in side-by-side relationship with each other, both the first and second thin films can be etched by the same etching amount through a subsequent etching step, so that the thin film layer can be shaped into a given shape. Thus, the surface of the thin film layer can be planarized.
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Kaneko Akihiro
Mori Nobuyuki
Nishiyama Michitaka
Watanabe Hisayoshi
Yokoyama Kenji
Cathey, Jr. David
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
TDK Corporation
Tran Binh X
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