Coating apparatus – Gas or vapor deposition – Work support
Patent
1995-12-22
1997-09-23
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Work support
118729, 118500, 156345, C23C 1600
Patent
active
056699778
ABSTRACT:
A lift pin arrangement for use in semiconductor processing apparatus wherein the lift pins are of a shape memory alloy. The lift pins exhibit superelasticity and/or shape memory effects which allows the lift pins to withstand substantial bending forces without permanent deformation thereof, and in the case where the lift pins become deformed it is possible to restraighten the lift pins simply by heating the lift pins to an appropriate temperature.
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Griffin Christopher
Shufflebotham Paul Kevin
Bueker Richard
Lam Research Corporation
Lund Jeffrie R.
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