Shadow frame with cross beam for semiconductor equipment

Details Shadow frame with cross beam for semiconductor equipment Shadow frame with cross beam for semiconductor equipment

2005-11-01

2005-11-01

Zervigon, Rudy (Department: 1763)

Coating apparatus

Gas or vapor deposition

Having means to expose a portion of a substrate to coating...

C118S721000, C118S728000, C156S345300, C156S345510, C156S345520, C156S345530

Reexamination Certificate

active

06960263

ABSTRACT:
A shadow frame and framing system for semiconductor fabrication equipment comprising a rectangular frame having four edges, the edges forming an interior lip with a top surface and an bottom engagement surface; and a cross beam disposed between at least two edges of the frame, the cross beam having a top surface and a bottom engagement surface, the engagement surface of the cross beam configured to be flush with the engagement surface of the lip; wherein one or more of the engagement surfaces are configured to cover metal interconnect bonding areas on a carrier disposed below the frame. The shadow frame is particularly useful in plasma enhanced chemical vapor deposition (PECVD) applications used to make active matrix liquid crystal displays (AMLCDs) and solar cells.

REFERENCES:
patent: 3608518 (1971-09-01), Poole
patent: 3887421 (1975-06-01), Hudson et al.
patent: 5332443 (1994-07-01), Chew et al.
patent: 5380566 (1995-01-01), Robertson et al.
patent: 5885751 (1999-03-01), Weidman et al.
patent: 5976989 (1999-11-01), Ishiguro
J.F. Shackelford, Introduction to Materials Science for Engineers; 3rd Ed. 1992, Macmillan Publishing Co., p. 757.

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