Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
Reexamination Certificate
2007-12-21
2010-02-02
Dickey, Thomas L (Department: 2893)
Semiconductor device manufacturing: process
Formation of semiconductive active region on any substrate
C427S255280
Reexamination Certificate
active
07655543
ABSTRACT:
Methods and apparatuses for selective epitaxial formation of films separately inject reactive species into a CVD chamber. The methods are particularly useful for selective deposition using volatile combinations of precursors and etchants. Formation processes include simultaneous supply of precursors and etchants for selective deposition, or sequential supply for cyclical blanket deposition and selective etching. In either case, precursors and etchants are provided along separate flow paths that intersect in the relatively open reaction space, rather than in more confined upstream locations.
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ASM America Inc.
Dickey Thomas L
Knobbe Martens Olson & Bear LLP
Yushin Nikolay
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