Semiconductor wafer support platform

Details Semiconductor wafer support platform Semiconductor wafer support platform

1996-07-18

1998-09-01

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

Work support

118723E, 118500, 156345, C23C 1600

Patent

active

058006230

ABSTRACT:
Premature equipment failure of susceptors used during plasma processing of semiconductor wafers is avoided by making the holes, characteristic of susceptors, such that the hole diameter is less that the susceptor thickness. In one embodiment, the susceptor includes a pattern of support struts which permits the planar top plate of the susceptor to be made quite thin and yet permits the diameter-to-thickness requirement to be met by aligning the pattern of holes with the pattern of support struts and having the holes penetrate the struts.

REFERENCES:
patent: 5213650 (1993-05-01), Wang et al.
patent: 5558717 (1996-09-01), Zhao et al.
patent: 5569350 (1996-10-01), Osada et al.
patent: 5665166 (1997-09-01), Deguchi et al.
patent: 5665167 (1997-09-01), Deguchi et al.
patent: 5688331 (1997-11-01), Aruga et al.
patent: 5700725 (1997-12-01), Hower et al.
patent: 5730803 (1998-03-01), Steger et al.

Affiliated with

Also associated with

Rating

Semiconductor wafer support platform does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor wafer support platform, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor wafer support platform will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-265943