4. Coating apparatus
  5. Gas or vapor deposition
  6. Work support

Timothy Scott Dyer

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Apparatus and method for dry milling of non-planar features on a

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Patent

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Apparatus and method for removing silicon dioxide residues...

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

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Semiconductor wafer support platform

Coating apparatus – Gas or vapor deposition – Work support
Patent

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Profile ID: LFUS-PAI-P-460826

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