Semiconductor wafer process chamber with susceptor back coating

Details Semiconductor wafer process chamber with susceptor back coating Semiconductor wafer process chamber with susceptor back coating

1996-09-25

1998-03-10

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

118725, C23C 1600

Patent

active

057256730

ABSTRACT:
The present disclosure is directed to an apparatus for depositing a layer of a material on a wafer. The apparatus includes a deposition chamber having an upper dome, a lower dome and a side wall between the upper and lower domes. A susceptor plate is in and extends across the deposition chamber to divide the deposition chamber into an upper portion above the susceptor plate and a lower portion below the susceptor plate. An exhaust passage formed through the side wall and is coupled to an upper passage which extends to the upper portion of the deposition chamber and is coupled to a lower passage which extends to the lower portion of the deposition chamber.

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