Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
Reexamination Certificate
2005-05-09
2008-05-20
Lee, Hsien Ming (Department: 2823)
Semiconductor device manufacturing: process
Chemical etching
Combined with coating step
C438S411000, C257S734000, C257S735000, C257S736000
Reexamination Certificate
active
07375032
ABSTRACT:
In a method according to the present invention, a substrate thinning process is performed on a bumped substrate prior to the ultimate solder reflow process to heal bump defects caused by the substrate thinning process. Concurrently, the risk of substrate breakage is reduced compared to the prior art process since the number of process steps, requiring handling of thinned substrates, is reduced.
REFERENCES:
patent: 5903058 (1999-05-01), Akram
patent: 5943597 (1999-08-01), Kleffner et al.
patent: 6107180 (2000-08-01), Munroe et al.
patent: 6121058 (2000-09-01), Shell et al.
patent: 6162652 (2000-12-01), Dass et al.
patent: 6258705 (2001-07-01), Chien et al.
patent: 6312830 (2001-11-01), Li et al.
patent: 6426281 (2002-07-01), Lin et al.
patent: 6426556 (2002-07-01), Lin
patent: 6426562 (2002-07-01), Farnworth
patent: 6462426 (2002-10-01), Kelkar et al.
patent: 6538323 (2003-03-01), Sakata et al.
patent: 6593220 (2003-07-01), Yu et al.
patent: 6610595 (2003-08-01), Seshan
patent: 6846719 (2005-01-01), Tong et al.
patent: 6936923 (2005-08-01), Lin et al.
patent: 6962867 (2005-11-01), Jackson et al.
patent: 6992001 (2006-01-01), Lin
patent: 7081404 (2006-07-01), Jan et al.
patent: 7119002 (2006-10-01), Lin
patent: 7189927 (2007-03-01), Sakuyama
patent: 7199036 (2007-04-01), Chan et al.
patent: 2002/0036337 (2002-03-01), Yi et al.
patent: 2002/0068425 (2002-06-01), Chen et al.
patent: 2002/0075031 (2002-06-01), Degani
patent: 2002/0079576 (2002-06-01), Seshan
patent: 2002/0185733 (2002-12-01), Chow et al.
patent: 2003/0121958 (2003-07-01), Ratificar et al.
patent: 2003/0157438 (2003-08-01), Tong et al.
patent: 2003/0162362 (2003-08-01), Tong et al.
patent: 2004/0016752 (2004-01-01), Ratificar et al.
patent: 2004/0040855 (2004-03-01), Batinovich
patent: 2004/0072387 (2004-04-01), Hong et al.
patent: 2004/0104261 (2004-06-01), Sterrett et al.
patent: 2004/0124171 (2004-07-01), Wu
patent: 2004/0166661 (2004-08-01), Lei
patent: 2004/0175657 (2004-09-01), Danovitch et al.
patent: 2004/0253804 (2004-12-01), Beica et al.
patent: 2005/0014355 (2005-01-01), Chan et al.
patent: 2005/0023328 (2005-02-01), Stipp et al.
patent: 2005/0176231 (2005-08-01), Shei et al.
patent: 2005/0176234 (2005-08-01), Shei et al.
patent: 2005/0253261 (2005-11-01), Farnworth
patent: 2006/0009023 (2006-01-01), Nair et al.
patent: 2006/0011703 (2006-01-01), Arita et al.
patent: 2006/0270108 (2006-11-01), Farnworth et al.
patent: 2007/0102815 (2007-05-01), Kaufmann et al.
patent: 2007/0114663 (2007-05-01), Brown et al.
patent: 1 351 298 (2003-03-01), None
patent: WO 96/02122 (1996-01-01), None
Kuechenmeister Frank
Lehr Matthias
Mergili Lothar
Seliger Frank
Wieland Marcel
Advanced Micro Devices , Inc.
Lee Hsien Ming
Singal Ankush K
Williams Morgan & Amerson P.C.
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