Semiconductor substrate, SOI substrate and manufacturing...

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S763000, C438S765000, C438S769000

Reexamination Certificate

active

06841490

ABSTRACT:
A substrate for a semiconductor device includes a crystalline silicon substrate; an insulative silicon compound layer thereon and a crystalline insulation layer on the insulative silicon compound layer, wherein the insulative silicon compound layer contains not more than 10 at % of component element of a material constituting the crystalline insulation layer, the component element being provided in the insulative silicon compound layer by diffusion.

REFERENCES:
patent: 4857485 (1989-08-01), Brennan et al.
patent: 5120707 (1992-06-01), Maxfield et al.
patent: 5252543 (1993-10-01), Tanaka et al.
patent: 5358925 (1994-10-01), Neville Connell et al.
patent: 5366953 (1994-11-01), Char et al.
patent: 5443030 (1995-08-01), Ishihara et al.
patent: 5582640 (1996-12-01), Okada et al.
patent: 5589407 (1996-12-01), Meyyappan et al.
patent: 5793057 (1998-08-01), Summerfelt
patent: 5828080 (1998-10-01), Yano et al.
patent: 5846505 (1998-12-01), Saegusa
patent: 6013553 (2000-01-01), Wallace et al.
patent: 6045626 (2000-04-01), Yano et al.
patent: 6093243 (2000-07-01), Okada et al.
patent: 6103009 (2000-08-01), Atoji
patent: 6121117 (2000-09-01), Sato et al.
patent: 6190963 (2001-02-01), Zhang et al.
patent: 6224668 (2001-05-01), Tamatsuka
patent: 6232242 (2001-05-01), Hata et al.
patent: 6454964 (2002-09-01), Scott et al.
patent: 6472276 (2002-10-01), Hilt et al.
patent: 6573209 (2003-06-01), Sambasivan et al.
patent: 6590236 (2003-07-01), El-Zein et al.
patent: 6613658 (2003-09-01), Koyama et al.
patent: 6645639 (2003-11-01), Sambasivan et al.
patent: 6653211 (2003-11-01), Unno et al.
patent: 7-150361 (1995-06-01), None
patent: 10-265948 (1998-10-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor substrate, SOI substrate and manufacturing... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor substrate, SOI substrate and manufacturing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor substrate, SOI substrate and manufacturing... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3416984

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.