Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2007-06-26
2007-06-26
Alejandro-Mulero, Luz (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
Reexamination Certificate
active
10350554
ABSTRACT:
A method includes removing at least a piece of a deposition chamber liner from a deposition chamber by passing it through a passageway to the deposition chamber through which semiconductor substrates pass into and out of the chamber for deposition processing. A replacement for the removed deposition chamber liner piece is provided into the chamber by passing the replacement through said passageway. A liner apparatus includes a plurality of pieces which when assembled within a selected semiconductor substrate deposition processor chamber are configured to restrict at least a majority portion of all internal wall surfaces which define said semiconductor substrate deposition processor chamber from exposure to deposition material within the chamber. At least some of the pieces are sized for passing completely through a substrate passageway to the chamber through which semiconductor substrates pass into and out of the chamber for deposition processing.
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Campbell Philip H.
Carpenter Craig M.
Dando Ross S.
Mardian Allen P.
Sandhu Gurtej S.
Alejandro-Mulero Luz
Micro)n Technology, Inc.
Wells St. John P.S.
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