Semiconductor structure with field-limiting rings and method for

Active solid-state devices (e.g. – transistors – solid-state diode – With means to increase breakdown voltage threshold – Floating pn junction guard region

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257488, 257490, H01L 2358

Patent

active

057773734

ABSTRACT:
An improved edge termination scheme for semiconductor structures includes field-limiting rings (13, 14 and 15) having a fine-to-coarse incrementing scheme (18, 19 and 20) which is spatially additive assuring constancy against lateral junction variation. This spatially increasing scheme greatly enhances breakdown voltage characteristics. Additionally, redundant rings (14) are used to further guarantee insensitivity of the device to manufacturing variations. Reverse floating polysilicon flaps (28, 29 and 30) may be included to aid surface stability, when exposure to stray surface charges is anticipated. Additionally, this scheme provides for easy voltage scalability.

REFERENCES:
patent: 3391287 (1968-07-01), Kao et al.
patent: 3555373 (1971-01-01), Kawana et al.
patent: 3763406 (1973-10-01), Bosselaar
patent: 3909119 (1975-09-01), Wolley
patent: 4055884 (1977-11-01), Jambotkar
patent: 4399449 (1983-08-01), Herman et al.
patent: 4414560 (1983-11-01), Lidow
patent: 4573066 (1986-02-01), Whight
patent: 5075739 (1991-12-01), Davies

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor structure with field-limiting rings and method for does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor structure with field-limiting rings and method for, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor structure with field-limiting rings and method for will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1209162

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.