Semiconductor producing device and semiconductor device...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With workpiece support

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C156S345520, C118S728000, C118S725000, C361S234000, C279S128000

Reexamination Certificate

active

07842160

ABSTRACT:
A tubular electrode (215) and a tubular magnet (216) are installed on an external section of a processing furnace (202) for an MMT device. A susceptor (217) for holding a wafer (200) is installed inside a processing chamber (201) of the processing furnace. A gate valve (244) for conveying the wafer into and out of the processing chamber; and a shower head (236) for spraying processing gas in a shower onto the wafer, are installed inside the processing furnace. A high frequency electrode (2) and a heater (3) are installed inside the susceptor (217) with a clearance between them and the walls forming the space. The clearances formed between the walls forming the space in the susceptor and the high frequency electrode and the heater prevent damage to the high frequency electrode and the heater even if a thermal expansion differential occurs between the high frequency electrode, the heater and the susceptor.

REFERENCES:
patent: 5060354 (1991-10-01), Chizinsky
patent: 5280156 (1994-01-01), Niori et al.
patent: 5423971 (1995-06-01), Arnold et al.
patent: 5462603 (1995-10-01), Murakami
patent: 5688331 (1997-11-01), Aruga et al.
patent: 5886863 (1999-03-01), Nagasaki
patent: 6082297 (2000-07-01), Pollock
patent: 6301434 (2001-10-01), McDiarmid
patent: 6448538 (2002-09-01), Miyata
patent: 6494958 (2002-12-01), Shamouilian et al.
patent: 6740853 (2004-05-01), Johnson
patent: 7230202 (2007-06-01), Hayashi et al.
patent: 01-104778 (1989-04-01), None
patent: 3-16122 (1991-01-01), None
patent: 7-78766 (1995-03-01), None
patent: 7-147253 (1995-06-01), None
patent: 8-078193 (1996-03-01), None
patent: 08-330291 (1996-12-01), None
patent: 08-330395 (1996-12-01), None
patent: 09-153485 (1997-06-01), None
patent: 10-189227 (1998-07-01), None
patent: 11-111620 (1999-04-01), None
patent: 2000-348853 (2000-12-01), None
patent: 2002-124479 (2002-04-01), None
patent: 2002-175869 (2002-06-01), None
patent: WO 03/073489 (2003-09-01), None
JP—08078193—Eng—Mar. 22, 1996.
Japanese Office Action dated Mar. 17, 2009, including an English-language translation.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor producing device and semiconductor device... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor producing device and semiconductor device..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor producing device and semiconductor device... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4206507

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.