Semiconductor processing apparatus

Details Semiconductor processing apparatus Semiconductor processing apparatus

1993-07-09

1995-08-29

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118725, C23C 1600

Patent

active

054456754

ABSTRACT:
A semiconductor processing apparatus comprises a vacuum processing chamber and a lamp house provided thereunder. A susceptor is provided in the processing chamber, and a semiconductor wafer is mounted thereon. The processing chamber and the lamp house are partitioned by a widow plate made of quartz glass in an airtight state. Eight light sources for heating are arranged in a circumferential form on a rotatable table at the portion which is in the lamp house and under the window plate. A sensor comprising a thermocouple for detecting energy of transmitted light is provided between the susceptor and the window plate. The sensor is connected to a measuring section comprising an A/D converter, and thereby detected data is converted from a digital signal to an observed value. The observed value is sent to a comparator to be compared with a predetermined reference model. A comparative result obtained by the comparator is transmitted to a controlling section. The control section induces the state of the window plate from the comparative result, and stops the power supply to the light source when the detected energy of the transmitted light is lower than a predetermined limit.

REFERENCES:
patent: 4680451 (1987-07-01), Grat
patent: 4773355 (1988-09-01), Reif
patent: 4836138 (1989-06-01), Robinson
patent: 4854263 (1989-08-01), Chang

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