Semiconductor processing

Details Semiconductor processing Semiconductor processing

2011-04-19

2011-04-19

Menz, Laura M (Department: 2813)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

By reaction with substrate

C438S787000, C438S778000

Reexamination Certificate

active

07928019

ABSTRACT:
Embodiments of the present disclosure include semiconductor processing methods and systems. One method includes forming a material layer on a semiconductor substrate by exposing a deposition surface of the substrate to at least a first and a second reactant sequentially introduced into a reaction chamber having an associated process temperature. The method includes removing residual first reactant from the chamber after introduction of the first reactant, removing residual second reactant from the chamber after introduction of the second reactant, and establishing a temperature differential substantially between an edge of the substrate and a center of the substrate via a purge process.

REFERENCES:
patent: 5755886 (1998-05-01), Wang et al.
patent: 6429152 (2002-08-01), Yang et al.
patent: 6435865 (2002-08-01), Tseng et al.
patent: 6585823 (2003-07-01), Van Wijck
patent: 6803546 (2004-10-01), Boas et al.
patent: 6828218 (2004-12-01), Kim et al.
patent: 6902763 (2005-06-01), Elers et al.
patent: 6929699 (2005-08-01), Whitesell
patent: 7056806 (2006-06-01), Basceri et al.
patent: 7060514 (2006-06-01), Mercaldi et al.
patent: 7105441 (2006-09-01), Derderian et al.
patent: 7112544 (2006-09-01), Doan et al.
patent: 7115528 (2006-10-01), Vaartstra et al.
patent: 7118783 (2006-10-01), Carpenter et al.
patent: 7128787 (2006-10-01), Castovillo et al.
patent: 7169713 (2007-01-01), Wu et al.
patent: 7183208 (2007-02-01), Doan et al.
patent: 7199023 (2007-04-01), Ahn et al.
patent: 7294202 (2007-11-01), Chen et al.
patent: 2006/0029792 (2006-02-01), Chen et al.
patent: 2006/0090694 (2006-05-01), Cho et al.
patent: 2006/0292841 (2006-12-01), Quick
patent: 2007/0065578 (2007-03-01), McDougall
patent: 2007/0084406 (2007-04-01), Yudovsky et al.
patent: 2007/0193637 (2007-08-01), Cantin et al.
patent: 2009/0042404 (2009-02-01), Surthi
patent: 2009/0176379 (2009-07-01), Surthi
patent: 07-249584 (1995-09-01), None
patent: 2003-0090463 (2003-11-01), None
Baek, Yang Gyu, International Search report from related PCT application mailed Mar. 12, 2009 (3 pgs.).

Affiliated with

Also associated with

Rating

Semiconductor processing does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor processing, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor processing will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2709731