Semiconductor probe with high resolution resistive tip and...

Details Semiconductor probe with high resolution resistive tip and... Semiconductor probe with high resolution resistive tip and...

2007-08-08

2010-11-09

Tran, Binh X (Department: 1713)

Etching a substrate: processes

Etching of semiconductor material to produce an article...

C438S048000

Reexamination Certificate

active

07828981

ABSTRACT:
A semiconductor probe with a high-resolution tip and a method of fabricating the same are provided. The semiconductor probe includes: a cantilever doped with a first impurity; a resistive convex portion projecting from an end portion of the cantilever and lightly doped with a second impurity opposite in polarity to the first impurity; and first and second electrode regions formed on either side of the resistive convex portion and heavily doped with the second impurity.

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Park et al. “Scanning Resistive Probe Microscopy: Imaging Ferroelectric Domains.” Applied Physics Letters, vol. 84, No. 10, Mar. 2004, pp. 1734-1736.

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