Semiconductor package and method of forming wire loop of...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257SE23024, C228S180500

Reexamination Certificate

active

07547626

ABSTRACT:
Provided are a semiconductor package and a method of forming a wire loop of the semiconductor package. The semiconductor package includes: at least one semiconductor chip; a lead frame including a plurality of leads; and a plurality of wire loops, the wire loops connecting an electrode pad of the semiconductor chip to the leads. Wire loops include: a ball connected to the electrode pad; a pressed part formed on an upper surface of the ball by pressing the wire to overlap two parts of the wire; a first wire part extending substantially horizontally from the pressed part and including at least a portion contacting an upper surface of the semiconductor chip; a second wire part extending at a downward incline from the first wire part; and a third wire part extending from the second wire part and including an end connected to one of the leads.

REFERENCES:
patent: 6222274 (2001-04-01), Nishiura et al.
patent: 6391759 (2002-05-01), Chao et al.
patent: 6933608 (2005-08-01), Fujisawa
patent: 2002/0056924 (2002-05-01), Chung et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor package and method of forming wire loop of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor package and method of forming wire loop of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor package and method of forming wire loop of... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4063204

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.