Semiconductor memory NAND with wide space between selection line

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

365 51, 365104, H01L 2968

Patent

active

053329171

ABSTRACT:
A semiconductor memory device having a NAND-type memory cell structure for preventing the occurrence of an electrical bridge resulting from impurity particles generated during a manufacturing process. The space between the word-line whereto a Vcc voltage is applied and the string selection line whereto a Vss voltage is applied and a space between the string selection line of the string selection transistor and the word-line of the cell transistor adjacent to the string selection transistor, are wider than that between the word-lines so as to prevent early stand-by current failure caused by the special stand-by conditions of a NAND-type memory cell. Therefore, the occurrence of a polysilicon bridge between the word-line and the string selection line due to impurity particles generated during the manufacturing process is prevented. As a result, a defectively manufactured chip can be resurrected by the data correction means provided within the memory device.

REFERENCES:
patent: 4481609 (1984-11-01), Higuchi et al.
patent: 4924438 (1990-05-01), Kobatake
patent: 5235200 (1993-08-01), Komori et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor memory NAND with wide space between selection line does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor memory NAND with wide space between selection line, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor memory NAND with wide space between selection line will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1054613

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.