Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2005-08-09
2005-08-09
Coleman, W. David (Department: 2823)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S309000, C438S243000, C438S245000, C438S396000
Reexamination Certificate
active
06927444
ABSTRACT:
A semiconductor memory device having a capacitor is disclosed. The capacitor includes a bottom capacitor surface formed of a silicon-germanium single crystalline layer or a dual layer in which a silicon-germanium single crystalline layer covers a silicon single crystalline layer. The bottom capacitor surface is uneven and is conventionally formed by an epitaxial method. The silicon germanium single crystalline layer is approximately 5 to 50 percent germanium content by weight. The method of fabricating the semiconductor memory device comprises: selectively exposing the surface of a single crystalline silicon substrate at the region where the capacitor bottom electrode is formed; supplying a source gas to grow a silicon germanium single crystalline layer at the surface of the selectively exposed silicon substrate; stacking a dielectric layer over the silicon germanium single crystalline layer; and stacking a conductive layer over the dielectric layer to form a capacitor top electrode. After forming the silicon germanium single crystalline layer to a predefined thickness, a silicon single crystalline layer can be further grown at the silicon germanium single crystalline layer. After forming the silicon germanium single crystalline layer and before forming the dielectric layer, annealing can be performed for a predefined time.
REFERENCES:
patent: 5291438 (1994-03-01), Witek et al.
patent: 5770500 (1998-06-01), Batra et al.
patent: 6255159 (2001-07-01), Thakur
patent: 6417536 (2002-07-01), De Boer et al.
patent: 6791131 (2004-09-01), Fazan et al.
patent: 6803621 (2004-10-01), Yang et al.
patent: 6867448 (2005-03-01), Lee et al.
patent: 2002/0158281 (2002-10-01), Goldbach et al.
patent: 2005/0023588 (2005-02-01), Sandhu et al.
Ha Jung-Min
Park Jung-Woo
Coleman W. David
Marger & Johnson & McCollom, P.C.
Nguyen Khiem
Samsung Electronics Co,. Ltd.
LandOfFree
Semiconductor memory device having capacitor and method of... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Semiconductor memory device having capacitor and method of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor memory device having capacitor and method of... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3447676