Semiconductor light-emitting element and substrate used in...

Active solid-state devices (e.g. – transistors – solid-state diode – Incoherent light emitter structure – With particular semiconductor material

Reexamination Certificate

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C257S190000, C257SE33043

Reexamination Certificate

active

07915635

ABSTRACT:
For a semiconductor laser, a stacked member comprising an active layer is formed on the surface of a GaN single-crystal substrate, a defect aggregation portion is formed on the rear face of the GaN single-crystal substrate, and an electrode is formed so as to be electrically connected to the defect aggregation portion on the rear face. The defect aggregation portion of this semiconductor laser has numerous crystal defects, and so the carrier concentration is high, and the electrical resistivity is lowered significantly. For this reason, in a semiconductor laser of this invention in which an electrode is formed on this defect aggregation portion, an Ohmic contact can easily be obtained between the GaN single-crystal substrate and the electrode, and by this means a lowered driving voltage is realized.

REFERENCES:
patent: 2004/0262624 (2004-12-01), Akita et al.
patent: 2003-183100 (2003-07-01), None
Arpan Chakraborty et al., “Nonpolar InGaN/GaN emitters on reduced-defect lateral epitaxially overgrown a-plane GaN with drive-current-independent electroluminescence emission peak,” Applied Physics Letters, Nov. 29, 2004, vol. 85, No. 22, pp. 5143-5145.
Kuniyoshi Okamoto, et al., “Dislocation-Freem-Plane InGaN/GaN Light-Emitting Diodes onm-Plane GaN Single Crystals,” Japanese Journal of Applied Physics, 2006, vol. 45, No. 45, pp. L1197-L1199.

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