Semiconductor integrated circuit pattern verification...

Details Semiconductor integrated circuit pattern verification... Semiconductor integrated circuit pattern verification...

2007-10-02

2007-10-02

Do, Thuan (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000, C703S014000

Reexamination Certificate

active

11176181

ABSTRACT:
A semiconductor integrated circuit pattern verification method includes executing simulation to obtain a simulation pattern to be formed on a substrate on the basis of a semiconductor integrated circuit design pattern, comparing the simulation pattern and the design pattern that is required on the substrate to detect a first difference value, extracting error candidates at which the first difference value is not less than a first predetermined value, comparing pattern shapes at the error candidates to detect a second difference value, combining, into one group, patterns whose second difference values are not more than a second predetermined value, and extracting a predetermined number of patterns from each group and verifying error candidates of the extracted patterns.

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Newmark et al.; “Large Area Optical Proximity Correction Using Pattern Based Corrections”: SPIE, vol. 2322, pp. 374-386 (1994).
Izuha et al.; “Pattern Verification Method, Pattern Verification System, Mask Manufacturing Method and Semiconductor Device Manufacturing Method”; U.S. Appl. No. 11/012,494, filed Dec. 16, 2004.

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