Semiconductor integrated circuit devices including gate...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257SE23145

Reexamination Certificate

active

07745876

ABSTRACT:
Provided are semiconductor integrated circuit (IC) devices including gate patterns having a step difference therebetween and a connection line interposed between the gate patterns. The semiconductor IC device includes a semiconductor substrate including a peripheral active region, a cell active region, and a device isolation layer. Cell gate patterns are disposed on the cell active region and the device isolation layer. A peripheral gate pattern is disposed on the peripheral active region. A cell electrical node is disposed on the cell active region adjacent to the cell gate patterns. Peripheral electrical nodes are disposed on the peripheral active region adjacent to the peripheral gate pattern. Connection lines are disposed on the cell gate patterns disposed on the device isolation layer. The connection lines are connected between the cell gate patterns and the peripheral gate pattern.

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English language abstract of Japanese Publication No. 7-66297, Mar. 10, 1995.
English language abstract of Korean Publication No. 2000-0015029, Mar. 15, 2000.
English language abstract of Korean Publication No. 10-2005-73099, Jul. 13, 2005.
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English language abstract of Korean Publication No. 10-2006-0033961, Apr. 21, 2006.
English language abstract of Korean Publication No. 10-2006-0042499, May 15, 2006.

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