Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2008-05-20
2011-11-08
Warren, Matthew E (Department: 2815)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S068000, C257S331000, C257S332000, C257S333000, C257S334000, C257S905000, C257S906000, C257S907000, C257S908000, C257SE21646, C257SE27084, C257SE27091
Reexamination Certificate
active
08053831
ABSTRACT:
A memory cell of memory device, comprises an active region of a memory cell defined in a semiconductor substrate, and a conductive gate electrode in a trench of the active region. The gate electrode is isolated from the semiconductor substrate. An insulation layer is on the active region and on the conductive gate electrode. A conductive contact is in the insulation layer on the active region at a side of the gate electrode and isolated from the gate electrode. The contact has a first width at a top portion thereof and a second width at a bottom portion thereof, the first width being greater than the second width. The contact is formed of a single-crystal material.
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Chen David
Onello & Mello LLP
Samsung Electronics Co,. Ltd.
Warren Matthew E
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