Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Patent
1996-08-05
1998-02-10
Thomas, Tom
Active solid-state devices (e.g., transistors, solid-state diode
Combined with electrical contact or lead
Of specified material other than unalloyed aluminum
257386, 257752, 257759, 257774, H01L 2348, H01L 2352
Patent
active
057172510
ABSTRACT:
After a pattern transfer of a first pattern image to a lower photo-sensitive layer of first material, a second pattern image is transferred to an upper photo-sensitive layer of second material higher in photo-sensitivity than the first material, and the first image and the second image are concurrently developed so as to form a composite etching mask through a simple process.
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"Dual Damascene: A Ulsi Wiring Technology"; Kaanta et al IEEE 1991, VMIC Conference, Jun. 11-12, pp. 144-153.
Hayashi Yoshihiro
Onodera Takahiro
NEC Corporation
Ostrowski David
Thomas Tom
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