Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate
Reexamination Certificate
2007-11-16
2010-11-09
Tran, Minh-Loan T (Department: 2826)
Semiconductor device manufacturing: process
Formation of semiconductive active region on any substrate
C257SE21125
Reexamination Certificate
active
07829442
ABSTRACT:
Dislocation pile-ups in compositionally graded semiconductor layers are reduced or eliminated, thereby leading to increased semiconductor device yield and manufacturability. This is accomplished by introducing a semiconductor layer having a plurality of threading dislocations distributed substantially uniformly across its surface as a starting layer and/or at least one intermediate layer during growth and relaxation of the compositionally graded layer. The semiconductor layer may include a seed layer disposed proximal to the surface of the semiconductor layer and having the threading dislocations uniformly distributed therein.
REFERENCES:
patent: 4010045 (1977-03-01), Ruehrwein
patent: 4710788 (1987-12-01), Dambkes et al.
patent: 4900372 (1990-02-01), Lee et al.
patent: 4987462 (1991-01-01), Kim et al.
patent: 4990979 (1991-02-01), Otto et al.
patent: 4997776 (1991-03-01), Harame et al.
patent: 5013681 (1991-05-01), Godbey et al.
patent: 5091767 (1992-02-01), Bean et al.
patent: 5097630 (1992-03-01), Maeda et al.
patent: 5155571 (1992-10-01), Wang et al.
patent: 5159413 (1992-10-01), Calviello et al.
patent: 5166084 (1992-11-01), Pfiester
patent: 5177583 (1993-01-01), Endo et al.
patent: 5202284 (1993-04-01), Kamins et al.
patent: 5207864 (1993-05-01), Bhat et al.
patent: 5208182 (1993-05-01), Narayan et al.
patent: 5210052 (1993-05-01), Takasaki et al.
patent: 5212110 (1993-05-01), Pfiester et al.
patent: 5221413 (1993-06-01), Brasen et al.
patent: 5241197 (1993-08-01), Murakami et al.
patent: 5250445 (1993-10-01), Bean et al.
patent: 5252173 (1993-10-01), Inoue et al.
patent: 5279687 (1994-01-01), Tuppen et al.
patent: 5285086 (1994-02-01), Fitzgerald, Jr.
patent: 5291439 (1994-03-01), Kauffmann et al.
patent: 5298452 (1994-03-01), Meyerson
patent: 5308444 (1994-05-01), Fitzgerald et al.
patent: 5310451 (1994-05-01), Tejwani et al.
patent: 5316958 (1994-05-01), Meyerson
patent: 5346848 (1994-09-01), Grupen-Shemansky et al.
patent: 5374564 (1994-12-01), Bruel et al.
patent: 5387796 (1995-02-01), Joshi et al.
patent: 5399522 (1995-03-01), Ohori et al.
patent: 5413679 (1995-05-01), Godbey
patent: 5424243 (1995-06-01), Takasaki et al.
patent: 5425846 (1995-06-01), Koze et al.
patent: 5426069 (1995-06-01), Selvakumar et al.
patent: 5426316 (1995-06-01), Mohammad
patent: 5434102 (1995-07-01), Watanabe et al.
patent: 5442205 (1995-08-01), Brasen et al.
patent: 5461243 (1995-10-01), Ek et al.
patent: 5461250 (1995-10-01), Burghartz et al.
patent: 5462883 (1995-10-01), Dennard et al.
patent: 5476813 (1995-12-01), Naruse et al.
patent: 5479033 (1995-12-01), Baca et al.
patent: 5484664 (1996-01-01), Kitahara et al.
patent: 5523243 (1996-06-01), Mohammad
patent: 5523592 (1996-06-01), Nakagawa et al.
patent: 5534713 (1996-07-01), Ismail et al.
patent: 5536361 (1996-07-01), Kondo et al.
patent: 5540785 (1996-07-01), Dennard et al.
patent: 5596527 (1997-01-01), Tomioka et al.
patent: 5617351 (1997-04-01), Bertin et al.
patent: 5630905 (1997-05-01), Lynch et al.
patent: 5633516 (1997-05-01), Mishima et al.
patent: 5659187 (1997-08-01), Legoues et al.
patent: 5683934 (1997-11-01), Candelaria
patent: 5698869 (1997-12-01), Yoshimi et al.
patent: 5714777 (1998-02-01), Ismail et al.
patent: 5728623 (1998-03-01), Mori et al.
patent: 5739567 (1998-04-01), Wong
patent: 5759898 (1998-06-01), Ek et al.
patent: 5777347 (1998-07-01), Bartelink
patent: 5786612 (1998-07-01), Otani et al.
patent: 5786614 (1998-07-01), Chuang et al.
patent: 5792679 (1998-08-01), Nakato
patent: 5801085 (1998-09-01), Kim et al.
patent: 5808344 (1998-09-01), Ismail et al.
patent: 5810924 (1998-09-01), Legoues et al.
patent: 5828114 (1998-10-01), Kim et al.
patent: 5847419 (1998-12-01), Imai et al.
patent: 5859864 (1999-01-01), Jewell
patent: 5877070 (1999-03-01), Goesele et al.
patent: 5891769 (1999-04-01), Liaw et al.
patent: 5906708 (1999-05-01), Robinson et al.
patent: 5906951 (1999-05-01), Chu et al.
patent: 5912479 (1999-06-01), Mori et al.
patent: 5943560 (1999-08-01), Chang et al.
patent: 5963817 (1999-10-01), Chu et al.
patent: 5966622 (1999-10-01), Levine et al.
patent: 5998807 (1999-12-01), Lustig et al.
patent: 6010937 (2000-01-01), Karam et al.
patent: 6013134 (2000-01-01), Chu et al.
patent: 6030884 (2000-02-01), Mori et al.
patent: 6033974 (2000-03-01), Henley et al.
patent: 6033995 (2000-03-01), Muller
patent: 6039803 (2000-03-01), Fitzgerald et al.
patent: 6058044 (2000-05-01), Sugiura et al.
patent: 6059895 (2000-05-01), Chu et al.
patent: 6074919 (2000-06-01), Gardner et al.
patent: 6096590 (2000-08-01), Chan et al.
patent: 6103559 (2000-08-01), Gardner et al.
patent: 6107653 (2000-08-01), Fitzgerald
patent: 6111267 (2000-08-01), Fischer et al.
patent: 6117750 (2000-09-01), Bensahel et al.
patent: 6124614 (2000-09-01), Ryum et al.
patent: 6130453 (2000-10-01), Mei et al.
patent: 6133799 (2000-10-01), Favors et al.
patent: 6140687 (2000-10-01), Shimomura et al.
patent: 6143636 (2000-11-01), Forbes et al.
patent: 6153495 (2000-11-01), Kub et al.
patent: 6154475 (2000-11-01), Soref et al.
patent: 6160303 (2000-12-01), Fattaruso
patent: 6162688 (2000-12-01), Gardner et al.
patent: 6184111 (2001-02-01), Henley et al.
patent: 6191006 (2001-02-01), Mori et al.
patent: 6191007 (2001-02-01), Matsui et al.
patent: 6191432 (2001-02-01), Sugiyama et al.
patent: 6194722 (2001-02-01), Fiorini et al.
patent: 6204529 (2001-03-01), Lung et al.
patent: 6207977 (2001-03-01), Augusto et al.
patent: 6210988 (2001-04-01), Howe et al.
patent: 6218677 (2001-04-01), Broekaert
patent: 6232138 (2001-05-01), Fitzgerald et al.
patent: 6235567 (2001-05-01), Huang
patent: 6242324 (2001-06-01), Kub et al.
patent: 6249022 (2001-06-01), Lin et al.
patent: 6251755 (2001-06-01), Furukawa et al.
patent: 6261929 (2001-07-01), Gehrke et al.
patent: 6266278 (2001-07-01), Harari et al.
patent: 6271551 (2001-08-01), Schmitz et al.
patent: 6271726 (2001-08-01), Fransis et al.
patent: 6291321 (2001-09-01), Fitzgerald
patent: 6313016 (2001-11-01), Kibbel et al.
patent: 6316301 (2001-11-01), Kant
patent: 6323108 (2001-11-01), Kub et al.
patent: 6329063 (2001-12-01), Lo et al.
patent: 6335546 (2002-01-01), Tsuda et al.
patent: 6339232 (2002-01-01), Takagi et al.
patent: 6350993 (2002-02-01), Chu et al.
patent: 6368733 (2002-04-01), Nishinaga et al.
patent: 6372356 (2002-04-01), Thornton et al.
patent: 6399970 (2002-06-01), Kubo et al.
patent: 6403975 (2002-06-01), Brunner et al.
patent: 6406589 (2002-06-01), Yanagisawa et al.
patent: 6407406 (2002-06-01), Tezuka et al.
patent: 6420937 (2002-07-01), Akatsuka et al.
patent: 6425951 (2002-07-01), Chu et al.
patent: 6429061 (2002-08-01), Rim
patent: 6475072 (2002-11-01), Canaperi et al.
patent: 6482749 (2002-11-01), Billington et al.
patent: 6503773 (2003-01-01), Fitzgerald
patent: 6515335 (2003-02-01), Christiansen et al.
patent: 6518644 (2003-02-01), Fitzgerald
patent: 6521041 (2003-02-01), Wu et al.
patent: 6525338 (2003-02-01), Mizushima et al.
patent: 6555839 (2003-04-01), Fitzgerald
patent: 6573126 (2003-06-01), Cheng et al.
patent: 6576532 (2003-06-01), Jones et al.
patent: 6583015 (2003-06-01), Fitzgerald et al.
patent: 6593191 (2003-07-01), Fitzgerald
patent: 6594293 (2003-07-01), Bulsara et al.
patent: 6602613 (2003-08-01), Fitzgerald
patent: 6603156 (2003-08-01), Rim
patent: 6833332 (2004-12-01), Christiansen et al.
patent: 7041170 (2006-05-01), Fitzgerald et al.
patent: 7049627 (2006-05-01), Vineis et al.
patent: 2001/0003364 (2001-06-01), Sugawara et al.
patent: 2001/0014570 (2001-08-01), Wenski et al.
patent: 2002/0017642 (2002-02-01), Mizushima et al.
patent: 2002/0043660 (2002-04-01), Yamazaki et al.
patent: 2002/0052084 (2002-05-01), Fitzgerald
patent: 2002/0084000 (2002-07-01), Fitzgerald
patent: 2002/0096717 (2002-07-01), Chu et al.
patent: 2002/0100942 (2002-08-01), Fitzgerald et al.
patent: 2002/0123167 (2002-09-01), Fitzgerald
patent: 2002/0123183 (2002-09-01), Fitzgerald
patent: 2002/0123197 (2002-09-01), Fitzgerald et al.
patent: 2002/0125471 (2002-09-01), Fitzgerald et al.
patent: 2002/0125497 (2002-09-01), Fitzgerald
patent: 2002/0168864 (2002-11-01), Cheng et al.
patent: 2002/0185
Currie Matthew T.
Leitz Christopher
Vineis Christopher
Westhoff Richard
Yang Vicky K.
Quinto Kevin
Slater & Matsil L.L.P.
Taiwan Semiconductor Manufacturing Company , Ltd.
Tran Minh-Loan T
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