Material or article handling – Process – Of material charging or discharging of a chamber of a type...
Reexamination Certificate
2007-01-30
2007-01-30
Fox, Charles A. (Department: 3652)
Material or article handling
Process
Of material charging or discharging of a chamber of a type...
C414S217000
Reexamination Certificate
active
10437207
ABSTRACT:
A robotic semiconductor handling system includes two robot arms for transferring substrates between processing, cooling, and storage stations. The first robot arm has a paddle-type end effector adapted such that it can support one substrate at a primary location as well as a second substrate at a secondary staging location. The second robot arm is a Bernoulli-style wand that transfers a substrate from the primary location to the secondary one, and transfers substrates from either location to the process chamber. The use of the dual-location paddle allows for a significant reduction in cycle-time over a single paddle location and a Bernoulli wand system.
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Alexander James A.
Crabb Richard
Wood Eric R.
ASM America Inc.
Fox Charles A.
Knobbe Martens Olson & Bear LLP
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