Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1996-12-26
1999-03-23
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
Multizone chamber
118663, 118707, 414936, 414937, C23C 1600
Patent
active
058853553
ABSTRACT:
A semiconductor fabrication apparatus having a process chamber and a handler which is provided for loading wafers into the process chamber or unloading wafers therefrom, comprising a plurality of switches for detecting positions of the handler and for generating detection signals in accordance with the positions; and an indicator for indicating normal operations of the switches. The indicator has relays operated in accordance with a voltage level of each of the detection signals; and LEDs associated with each of the relays, for identifying a normal operation of the handler. By confirming the conductive
onconductive state of the LED, the operator can easily determine if the switches are accurately detecting the position of a load fork and/or an aligning plate.
Song Byoung-soo
Yu Chan-Il
Breneman R. Bruce
Lund Jeffrie R.
Samsung Electronics Co,. Ltd.
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