Semiconductor devices having contact plugs including...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S374000, C257S381000, C257S395000, C257S774000

Reexamination Certificate

active

10982113

ABSTRACT:
Forming a semiconductor device can include forming an insulating layer on a semiconductor substrate including a conductive region thereof, wherein the insulating layer has a contact hole therein exposing a portion of the conductive region. A polysilicon contact plug can be formed in the contact hole wherein at least a portion of the polysilicon contact plug is doped with an element having a diffusion coeffient that is less than a diffusion coefficient of phosphorus (P). Related structures are also discussed.

REFERENCES:
patent: 5517044 (1996-05-01), Koyama
patent: 5567644 (1996-10-01), Rulfson et al.
patent: 5792695 (1998-08-01), Ono et al.
patent: 5804470 (1998-09-01), Wollesen
patent: 6232196 (2001-05-01), Raaijmakers et al.
patent: 6243285 (2001-06-01), Kurth et al.
patent: 6274489 (2001-08-01), Ono et al.
patent: 6479341 (2002-11-01), Lu
patent: 2003/0049372 (2003-03-01), Cook
patent: 06-085188 (1994-03-01), None
patent: 10-1997-0022171 (1997-05-01), None
patent: 10-0232984 (1999-12-01), None
English Translation of Korean Office Action dated Mar. 23, 2004.

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