Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2006-12-05
2006-12-05
Flynn, Nathan J. (Department: 2826)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S142000, C438S197000, C438S238000, C438S239000, C438S243000, C257SE21396, C257S301000, C257S303000
Reexamination Certificate
active
07144772
ABSTRACT:
A semiconductor device having MIM capacitors is configured so that the bottom surface of the lower electrode and a top surface area of an oxidation barrier pattern are substantially equal. Related methods for forming the device are also described.
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Jang Nak-Won
Joo Heung-Jin
Lee Sung-Yung
Flynn Nathan J.
Myers Bigel & Sibley Sajovec, PA
Quinto Kevin
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