Semiconductor devices having capacitors of...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

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C438S142000, C438S197000, C438S238000, C438S239000, C438S243000, C257SE21396, C257S301000, C257S303000

Reexamination Certificate

active

07144772

ABSTRACT:
A semiconductor device having MIM capacitors is configured so that the bottom surface of the lower electrode and a top surface area of an oxidation barrier pattern are substantially equal. Related methods for forming the device are also described.

REFERENCES:
patent: 5459345 (1995-10-01), Okudaira et al.
patent: 5563762 (1996-10-01), Leung et al.
patent: 5959319 (1999-09-01), Iwasa
patent: 6001682 (1999-12-01), Chien
patent: 6090697 (2000-07-01), Xing et al.
patent: 6118144 (2000-09-01), Kimura
patent: 6353269 (2002-03-01), Huang
patent: 6452229 (2002-09-01), Krivokapic
patent: 6458284 (2002-10-01), Kashihara
patent: 2001/0006245 (2001-07-01), Yunogami et al.
patent: 2002/0008724 (2002-01-01), Kubota et al.
patent: 2002-0002599 (2002-01-01), None

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