Semiconductor devices having buried bit lines and methods of...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S208000, C257S209000, C257S390000, C257S391000, C257SE29309

Reexamination Certificate

active

11240544

ABSTRACT:
A semiconductor device includes a semiconductor substrate having a first conductivity type and having an upper portion, a pair of bit lines extending in a first direction and doped with an impurity of a second conductivity type opposite to the first conductivity type and spaced from one another in the upper portion of the semiconductor substrate, a first line formed between the pair of bit lines having a plurality of alternating recessed device isolation regions and channel regions, with each of the channel regions contacting each bit line of the at least one pair of bit lines, and word lines formed at right angles to the first lines and covering the channel regions.

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patent: 2004-095904 (2004-03-01), None
patent: 1020020073960 (2002-09-01), None
Philips Research-Embedded non-volatile memories. http://www.research.com/technologies/ics
ymemories/, 2004-2005.
Notice to Submit a Response for Korean Patent Application No. 10-2004-0107993 mailed on Feb. 28, 2006.

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