Semiconductor devices and methods of fabricating the same

Details Semiconductor devices and methods of fabricating the same Semiconductor devices and methods of fabricating the same

2007-07-24

2009-08-04

Nguyen, Ha Tran T (Department: 2829)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C438S585000, C438S589000

Reexamination Certificate

active

07569480

ABSTRACT:
In a method of fabricating a semiconductor device, a first mask pattern is formed on a substrate. The first mask pattern has a first opening formed to expose the substrate. An oxidation barrier region is formed in the substrate exposed by the first opening, and the first mask pattern is patterned to form a second mask pattern having a second opening. A gate insulation layer is formed on the substrate exposed by the second opening. The gate insulation layer has a variable thickness.

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