Semiconductor device with specifically shaped contact holes

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S296000, C257S310000, C257S773000, C257S774000

Reexamination Certificate

active

10860577

ABSTRACT:
An interlayer insulating film covering a ferroelectric capacitor is formed, and through the interlayer insulating film, contact holes each reaching a capacitor electrode are formed. A wiring connected to the capacitor electrode through the contact hole is further formed above the interlayer insulating film. A planar shape of the contact hole is a regular octagon, a regular rectangle with four angles thereof being rounded, an octagon with a length of each neighboring side thereof being different to each other, a circle, and so forth.

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Patent Abstracts of Japan, Publication No. 4-162652, dated Jun. 8, 1992.
Patent Abstracts of Japan, Publication No. 2001-351920, dated Dec. 21, 2001.

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