Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2006-05-16
2006-05-16
Kebede, Brook (Department: 2823)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C257S314000, C257S913000
Reexamination Certificate
active
07045418
ABSTRACT:
The present invention provides a semiconductor device (200), a method of manufacture therefor and an integrated circuit including the same. In one embodiment of the invention, the semiconductor device (200) includes a floating gate (230) located over a semiconductor substrate (210), wherein the floating gate (230) has a metal control gate (250) located thereover. The semiconductor device (200), in the same embodiment, further includes a dielectric layer (240) located between the floating gate230and the metal control gate (250), the dielectric layer (240) having a gettering material located therein.
REFERENCES:
patent: 3933530 (1976-01-01), Mueller et al.
patent: 4814854 (1989-03-01), Tigelaar et al.
patent: 4971924 (1990-11-01), Tigelaar et al.
patent: 5215933 (1993-06-01), Araki
patent: 5393686 (1995-02-01), Yeh et al.
patent: 5502321 (1996-03-01), Matsushita
patent: 6207989 (2001-03-01), Li et al.
patent: 6762446 (2004-07-01), Amiotti et al.
patent: 2000236030 (2000-08-01), None
Hao Pinghai
Ivanov Victor
Mitros Jozef
Tian Weidong
Brady III W. James
Kebede Brook
McLarty Peter K.
Telecky , Jr. Frederick J.
Texas Instruments Incorporated
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