Semiconductor device having vertically aligned pillar...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

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Details

C438S589000, C438S156000, C257SE21429

Reexamination Certificate

active

08039347

ABSTRACT:
A semiconductor device having vertically aligned transistors made from pillar structures that have flat side surfaces is presented. The semiconductor device includes a semiconductor substrate, spacers, and gates. The semiconductor substrate has pillar structures that have flat side surfaces. The spacers are on sidewalls only on the upper portions of the pillar structures. The gates surround lower portions of the pillar structures.

REFERENCES:
patent: 7935598 (2011-05-01), Lee
patent: 2006/0097304 (2006-05-01), Yoon et al.
patent: 1020030019639 (2003-03-01), None
patent: 1020070091833 (2007-09-01), None

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