Semiconductor device manufacturing: process – With measuring or testing
Reexamination Certificate
2007-03-27
2007-03-27
Kebede, Brook (Department: 2823)
Semiconductor device manufacturing: process
With measuring or testing
C257S048000, C324S229000
Reexamination Certificate
active
11157534
ABSTRACT:
A semiconductor device having a measuring pattern that enhances measuring reliability and a method of measuring the semiconductor device using the measuring pattern. The semiconductor device includes a semiconductor substrate having a chip area in which an integrated circuit is formed, and a scribe area surrounding the chip area. The semiconductor device also includes a measuring pattern formed in the scribe area and having a surface sectional area to include a beam area in which measuring beams are projected, and a dummy pattern formed in the measuring pattern to reduce the surface sectional area of the measuring pattern. The surface sectional area of the dummy pattern occupies from approximately 5% to approximately 15% of a surface sectional area of the beam area.
REFERENCES:
patent: 6218847 (2001-04-01), Matsushita
patent: 6603162 (2003-08-01), Uchiyama et al.
patent: 2001/0015811 (2001-08-01), Ravid
patent: 2001/0026364 (2001-10-01), Ravid
patent: 2002/0036505 (2002-03-01), Narita
patent: 2002/0090743 (2002-07-01), Johnson
patent: 2002/0106837 (2002-08-01), Cleeves et al.
patent: 2002/0179941 (2002-12-01), Ootake et al.
patent: 2003/0193050 (2003-10-01), Park et al.
patent: 10144635 (1998-05-01), None
patent: 10-2003-0049573 (2003-06-01), None
Kim Dai-Geun
Kim Jin-Woo
Kim Joo-Chan
Kim Kook-Min
Kim Yong-Hee
F. Chau & Associates
Kebede Brook
Kim Su C.
Samsung Electronics Co,. Ltd.
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