Semiconductor device configured for suppressed germanium...

Active solid-state devices (e.g. – transistors – solid-state diode – Including semiconductor material other than silicon or... – Containing germanium – ge

Reexamination Certificate

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C257S351000, C257S371000, C257S385000, C257S407000, C257S757000, C257S768000, C257S769000

Reexamination Certificate

active

07009279

ABSTRACT:
In semiconductor devices, a semiconductor device is provided which is high in reliability while suppressing changes in characteristics such as threshold voltages. In a semiconductor device which has a gate dielectric film above a semiconductor substrate and also has above the gate dielectric film a gate electrode film made of silicon germanium chosen as its main constituent material, or alternatively in a semiconductor device which has beneath the gate dielectric film a channel made of silicon as its main constituent material and which has below the channel a channel underlayer film made of silicon germanium as its main constituent material, a specifically chosen dopant, such as cobalt (Co) or carbon (C) or nitrogen (N), is added to the gate electrode and the channel underlayer film, for use as the unit for suppressing diffusion of germanium in the gate electrode or in the channel underlayer film.

REFERENCES:
patent: 5608266 (1997-03-01), Agnello et al.
patent: 6214679 (2001-04-01), Murthy et al.
patent: 6252283 (2001-06-01), Gardner et al.
patent: 2000-077425 (2000-03-01), None
patent: 2000-269501 (2000-09-01), None
patent: 2002-134741 (2002-05-01), None
patent: 2002-184993 (2002-06-01), None
Journal of Applied Physics(Sep. 1983), 54(9):4877.
Thomas Kwok, et al., “Molecular-Dynamics Studies of Grain-Boundary . . . ,”Physical Review B(1984), 29:5367-69.

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