Semiconductor device and manufacturing method thereof

Active solid-state devices (e.g. – transistors – solid-state diode – Lead frame – With stress relief

Reexamination Certificate

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C257S738000, C257S780000, C257S787000, C438S123000, C438S124000

Reexamination Certificate

active

06946723

ABSTRACT:
A semiconductor device having a semiconductor element is obtained by cutting a semiconductor wafer, having an electrode pad formed on one side thereof, along a scribe line. The semiconductor device has a semiconductor element protective layer on the semiconductor element so as to form an opening above the pad, a stress cushioning layer on the layer so as to form an opening on the pad, a lead wire portion reaching the layer from the electrode pad via the openings, external electrodes on the lead wire portion, and a conductor protective layer on the layer. The layer, the layer, and the conductor protective layer form respective end faces on the end surface of the semiconductor element inside the scribe line and expose a surface of the semiconductor element from the end face of the end surface to a point inside of the scribe line, thereby to expose the scribe line.

REFERENCES:
patent: 5148265 (1992-09-01), Khandros et al.
patent: 5757078 (1998-05-01), Matsuda et al.
patent: 5773888 (1998-06-01), Hosomi et al.
patent: 5888849 (1999-03-01), Johnson
patent: 6097085 (2000-08-01), Ikemizu et al.
patent: 6111317 (2000-08-01), Okada et al.
patent: 6258631 (2001-07-01), Ito et al.
patent: 6313532 (2001-11-01), Shimoishizaka et al.
patent: 6320267 (2001-11-01), Yukawa
patent: 6452270 (2002-09-01), Huang
patent: 6608389 (2003-08-01), Hashimoto
patent: 6624504 (2003-09-01), Inoue et al.
patent: 6664135 (2003-12-01), Miyazaki et al.
patent: 2002/0068424 (2002-06-01), Hashimoto
patent: 2002/0130412 (2002-09-01), Nagai et al.
patent: 09-232256 (1997-09-01), None
patent: 10-027827 (1998-01-01), None
patent: 10-092865 (1998-04-01), None
Nikkei Microdevices, CSP, Feb. 1998, pp. 40-64.
Nikkei Microdevices, CSP, Apr. 1998, pp. 164-167.

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