Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2007-10-16
2007-10-16
Elms, Richard T. (Department: 2824)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S369000
Reexamination Certificate
active
11180786
ABSTRACT:
A semiconductor device includes a semiconductor substrate of a first conductivity type, a well of the first conductivity type formed in the semiconductor substrate, a transistor formed in the well, a diffusion region of a second conductivity type formed in the semiconductor substrate so as to cover a lateral side and a bottom edge of the well, a terminal formed on the semiconductor substrate at an outside part of the diffusion region, and a conductive region contacting with the well, the well being in ohmic contact with the terminal via the conductive region and the semiconductor substrate, the conductive region having an impurity concentration level exceeding an impurity concentration level of the semiconductor substrate.
REFERENCES:
patent: 5281842 (1994-01-01), Yasuda et al.
patent: 5668755 (1997-09-01), Hidaka
patent: 5818099 (1998-10-01), Burghartz et al.
patent: 6091113 (2000-07-01), Tanaka
patent: 6194776 (2001-02-01), Amano et al.
patent: 6300819 (2001-10-01), De et al.
patent: 7060566 (2006-06-01), Vogelsang
patent: 2006/0151836 (2006-07-01), Salcedo et al.
patent: 10-199993 (1998-07-01), None
patent: 10-199993 (1998-10-01), None
European Search Report dated Jun. 23, 2006.
Iriyama Yasunori
Nomura Hiroshi
Tanaka Takuji
Bernstein Allison P.
Elms Richard T.
Fujitsu Limited
Westerman, Hattori, Daniels & Adrian , LLP.
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