Semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – With means to increase breakdown voltage threshold – Reverse-biased pn junction guard region

Reexamination Certificate

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Details

C257S496000

Reexamination Certificate

active

07999347

ABSTRACT:
A semiconductor layer of a vertical diode is divided into a center region and a surrounding region. An anode electrode contacts a surface of the center region in the semiconductor layer. An insulation layer contacts a surface of the surrounding region in the semiconductor layer. Ring-shaped FLR regions are formed in the surface of the surrounding region in the semiconductor layer. The innermost FLR region extends from an inside to an outside of a boundary between the anode electrode and the insulation layer, and extends along the boundary. A shoulder portion is formed in the surface of the semiconductor layer in a manner such that a portion that contacts the insulation layer is higher than a portion that contacts the anode electrode. Flows of holes directed toward the anode electrode pass through a plurality of positions in the shoulder portion.

REFERENCES:
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patent: 2000-114550 (2000-04-01), None
patent: 2000-312013 (2000-11-01), None
patent: 2000-340806 (2000-12-01), None
patent: 2002-270857 (2002-09-01), None
patent: 2002-368231 (2002-12-01), None
patent: 2003-249663 (2003-09-01), None
patent: 2007-042836 (2007-02-01), None
Office Action issued May 17, 2011 in JP 2008-138424 & partial English translation thereof.

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