Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2006-06-01
2008-05-06
Sefer, A. (Department: 2826)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S243000, C438S734000, C257SE21209, C257SE21682, C257SE21703, C257SE27103, C257SE27112, C257SE29302
Reexamination Certificate
active
07368341
ABSTRACT:
An explanation is given of, inter alia, a circuit arrangement containing a trench which penetrates through a charge-storing layer (18) and a doped semiconductor layer (14). The trench simultaneously fulfils a multiplicity of functions, namely an insulating function between adjacent components, the patterning of the charge-storing layer and also the subdivision of doping layers of the semiconductor layer (14).
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Gratz Achim
Knobloch Klaus
Schuler Franz
Brinks Hofer Gilson & Lione
Infineon - Technologies AG
Sefer A.
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