Semiconductor circuit and method of fabricating the same

Details Semiconductor circuit and method of fabricating the same Semiconductor circuit and method of fabricating the same

1996-04-10

1998-07-21

Niebling, John

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

438 30, 438487, H01L 2184

Patent

active

057834687

ABSTRACT:
Method of fabricating a semiconductor circuit is initiated with formation of an amorphous silicon film. Then, a second layer containing at least one catalytic element is so formed as to be in intimate contact with the amorphous silicon film, or the catalytic element is introduced into the amorphous silicon film. This amorphous silicon film is selectively irradiated with laser light or other equivalent intense light to crystallize the amorphous silicon film.

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