Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Reexamination Certificate
2008-07-12
2011-12-27
Hamilton, Cynthia (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
C430S325000, C430S327000, C430S272100, C430S271100, C430S273100, C430S311000, C430S935000, C438S952000
Reexamination Certificate
active
08084193
ABSTRACT:
A coating process comprises forming a patterned material layer on a substrate using a self-segregating polymeric composition comprising a polymeric photoresistive material and an antireflective coating material. The polymeric photoresistive material and the antireflective coating material that make up the self segregating composition are contained in a single solution. When depositing this solution on a substrate and removing the solvent, the two materials self-segregate into two layers. The substrate can comprise one of a ceramic, dielectric, metal, or semiconductor material and in some instances a material such as a BARC material that is not from the self segregating composition. The composition may also contain a radiation-sensitive acid generator and a base quencher. This produces a coated substrate having a uniaxial bilayer coating oriented in a direction orthogonal to the substrate with a top photoresistive coating layer and a bottom antireflective coating layer. The process may also include optionally coating a top coat material on the coated substrate. Pattern-wise exposing the coated substrate to imaging radiation and contacting the coated substrate with a developer, produces the patterned material layer wherein the optional top coat material and a portion of the photoresist layer are simultaneously removed from the coated substrate, thereby forming a patterned photoresist layer on the substrate. Alternatively, the optional top coat material, a portion of the photoresist layer and a portion of the bottom antireflective layers are simultaneously removed from the coated substrate by the developer, thereby forming a patterned photoresist layer on the substrate.
REFERENCES:
patent: 5693691 (1997-12-01), Flaim et al.
patent: 6010829 (2000-01-01), Rogers et al.
patent: 6916594 (2005-07-01), Bok et al.
patent: 7241707 (2007-07-01), Meagley et al.
patent: 2001/0018160 (2001-08-01), Ueda et al.
patent: 2003/0010748 (2003-01-01), Kodama et al.
patent: 2003/0099897 (2003-05-01), Fedynyshyn
patent: 2006/0093959 (2006-05-01), Huang et al.
patent: 2006/0134546 (2006-06-01), Huang et al.
patent: 2006/0183348 (2006-08-01), Meagley et al.
patent: 2006/0188804 (2006-08-01), Allen et al.
patent: 2006/0275697 (2006-12-01), Hata et al.
patent: 2007/0015082 (2007-01-01), Angelopoulos et al.
patent: 2007/0015083 (2007-01-01), Babich et al.
patent: 2007/0196748 (2007-08-01), Angelopoulos et al.
patent: 2007/0254235 (2007-11-01), Allen et al.
patent: 2007/0254237 (2007-11-01), Allen et al.
patent: 2008/0008955 (2008-01-01), Brodsky et al.
patent: 2008/0008965 (2008-01-01), Ohashi et al.
patent: WO-03/044079 (2003-05-01), None
Baney et al , Silsesquioxanes, Chem.Rev. American Chemixal Society,. 1995 vol. 95, pp. 1409-1430.
WO/2003/044079 Baldwin, et al.SpI9n-On Glass Anti-Reflective Coatings for Photolithography, Published May 3, 2003.
Chem 421: Introduction to Polymer Chemistry: The Chemistry of Photoresistshttp://chem.chem.rochester.edu/˜chem421/polymod2.htm.
Cheng Joy
Goldfarb Dario L
Medeiros David R
Pfeifer Dirk
Sanders Daniel P
Eichelburg Robert J.
Hamilton Cynthia
International Business Machines - Corporation
The Law Offices of Robert J. Eichelburg
LandOfFree
Self-segregating multilayer imaging stack with built-in... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Self-segregating multilayer imaging stack with built-in..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Self-segregating multilayer imaging stack with built-in... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4307804