Optics: measuring and testing – By polarized light examination – Of surface reflection
Patent
1993-04-26
1995-04-18
Pham, Hoa Q.
Optics: measuring and testing
By polarized light examination
Of surface reflection
356382, 250225, G01J 400, G02F 101
Patent
active
054083222
ABSTRACT:
An ellipsometric measuring system is set-up in association with a vacuum chamber on a production line for thin film samples. The ellipsometer has a scanner for directing the incident light beam to different locations on a thin film sample, and the ellipsometer also has an aperture for limiting the reflected light beam received by the photodetector. The scanner implements a method of aligning the incident beam to a selected surface of the sample. The scanner and the aperture are used to provide a finer adjustment of the incident beam with respect to the selected surface. The ellipsometric measuring system further uses test thin film samples with known film thicknesses and index or refractions to calculate a value for the angle of incidence of the incident light beam.
REFERENCES:
patent: 3880524 (1975-04-01), Dill et al.
patent: 4077720 (1978-03-01), Kasai
patent: 4983823 (1991-01-01), Isobe
Applied Optics, vol. 14, No. 1, Jan. 1975, article entitled "High Precision Scanning Ellipsometer" by D. E. Aspnes and A. A. Studna.
Ellipsometry and Polarized Light-Azzam & Bashara, North-Holland, 1987 pp. 282-289; pp. 232-341.
De Bhola N.
Hsu Jon S.
Robison Rodney L.
Yasar Tugrul
Materials Research Corporation
Pham Hoa Q.
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