Self-aligned spatial frequency doubling

Details Self-aligned spatial frequency doubling Self-aligned spatial frequency doubling

2011-03-15

2011-03-15

Duda, Kathleen (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

C430S324000

Reexamination Certificate

active

07906275

ABSTRACT:
In accordance with the invention, there are methods for self-aligned spatial frequency doubling in one dimension and also in two dimension. The method for self-aligned spatial frequency doubling in one dimension can include forming a film stack over a substrate, wherein the film stack comprises a photoresist layer and forming a one-dimensional periodic first pattern having a first pitch p on the photoresist layer using an optical exposure, wherein the first pitch p is at least smaller than twice the bandpass limit for optical exposures. The method can also include forming a second pattern using the first pattern by nonlinear processing steps, wherein the second pattern has a second pitch p2=p/2.

REFERENCES:
patent: 5360698 (1994-11-01), Hanrahan
patent: 6239008 (2001-05-01), Yu et al.
patent: 2004/0029052 (2004-02-01), Park et al.
patent: 2006/0274295 (2006-12-01), Brueck et al.

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