Self-aligned dual-floating gate memory cell and method for...

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate

Reexamination Certificate

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C438S257000

Reexamination Certificate

active

06858501

ABSTRACT:
An integrated circuit that includes a first dual-floating gate memory cell having a first floating gate isolated from a second floating gate for storing at least one bit of datum, and a second dual-floating gate memory cell having a third floating gate isolated from a fourth floating gate for storing at least one bit of datum, wherein the first dual-floating gate memory cell and the second dual-floating gate memory cell share a control gate, wherein the second floating gate of the first dual-floating gate memory cell shares an oxide layer with the third floating gate of the second dual-floating gate memory cell, and wherein the oxide layer electrically insulates the second and third floating gates from the control gate.

REFERENCES:
patent: 5929480 (1999-07-01), Hisamune
patent: 6133098 (2000-10-01), Ogura et al.
patent: 6197660 (2001-03-01), Jang et al.
patent: 6271090 (2001-08-01), Huang et al.
patent: 6281545 (2001-08-01), Liang et al.
patent: 6495898 (2002-12-01), Iwamatsu et al.
patent: 6512263 (2003-01-01), Yuan et al.
patent: 6566707 (2003-05-01), Sudo et al.

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