Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2005-02-22
2005-02-22
Pham, Long (Department: 2814)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S257000
Reexamination Certificate
active
06858501
ABSTRACT:
An integrated circuit that includes a first dual-floating gate memory cell having a first floating gate isolated from a second floating gate for storing at least one bit of datum, and a second dual-floating gate memory cell having a third floating gate isolated from a fourth floating gate for storing at least one bit of datum, wherein the first dual-floating gate memory cell and the second dual-floating gate memory cell share a control gate, wherein the second floating gate of the first dual-floating gate memory cell shares an oxide layer with the third floating gate of the second dual-floating gate memory cell, and wherein the oxide layer electrically insulates the second and third floating gates from the control gate.
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Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Pham Long
Pizarro-Crespo Marcos D.
Winbond Electronics Corporation
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